bullseye

guiding_light

10th December 2006 - 08:54 AM

http://www.physorg.com/news84729573.html

For nanometer level accuracy, it is important to use many measurements per point, and more than two points for alignment. Four points can distinguish a rhombus from a rectangle, for example.

Even in electron-beam lithography, the alignment marks can be quite big (100 nm or more). You just need to measure better for a better alignment.

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