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guiding_light
30th January 2008 - 12:32 AM
Looking into the applications of NIL to topography, a concern with the UV-NIL approach is the reflection of the curing UV light (which is occuring in near field). Leads me to think the integration of a BARC (bottom anti-reflection coating) should be considered.
guiding_light
30th January 2008 - 06:29 AM
This is made more complicated by fact that UV curing changes absorption of the polymer.
guiding_light
30th January 2008 - 12:30 PM
Of course, use thick photoresist! tongue.gif Can even be imprinted!
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