To add comments or start new threads please go to the full version of: Pair Patterning
PhysOrgForum Science, Physics and Technology Discussion Forums > Nanotechnology & Quantum Physics > Nanotechnology

guiding_light
Often it is claimed "we have drawn a line x nm wide" or "a y nm hole was achieved" but the hardest thing is to print two such small features side by side, and only two.

Like two small contact holes or two closely spaced transistor gates. The distance between the two features can be harder than the feature size itself. It can be strongly disturbed by defocus and other effects. The distance between two contact holes is especially disturbed by shot noise and secondary electron proximity effects. The distance between two lines is especially sensitive to roughness for the same reasons.
yor_on
So 'reality' breaks down then?
Alice in the wonderland :) as we wander down to those smallest definitions of our 'reality' and the way we do it is by 'radiation'. That supreme 'substance' that doesn't seem to want to decide whether it's a particle or a wave.
PhysOrg scientific forums are totally dedicated to science, physics, and technology. Besides topical forums such as nanotechnology, quantum physics, silicon and III-V technology, applied physics, materials, space and others, you can also join our news and publications discussions. We also provide an off-topic forum category. If you need specific help on a scientific problem or have a question related to physics or technology, visit the PhysOrg Forums. Here you’ll find experts from various fields online every day.
To quit out of "lo-fi" mode and return to the regular forums, please click here.
©PhysOrg.com - physics and technology news - Version for PDAs