http://www.semiconductor.net/article/CA645...ndustryid=47299

Europe’s EUV Research Project, More Moore, Comes to a Close

Staff -- Semiconductor International, 7/12/2007 6:25:00 AM

The “More Moore” research project, funded by the European Commission to promote European development of extreme ultraviolet lithography (EUVL), concluded its work by claiming a list of advances, including light source, optical coatings, simulation software, photo electron emission microscopy, and resists.

The More Moore project began in January 2004 and drew to a close with a final review of its findings on June 28. The findings resulted in more than 30 publications in scientific and industry journals, 177 presentations at industry conferences, and 21 patents granted or applied for.

“Our aim was to resolve technical problems of EUVL, to prepare the industry for volume production,” said Rob Hartman, director of ASML’s strategic technology program and leader of the More Moore project. “We have made vital technological breakthroughs, thanks to the teamwork of Europe’s leading EUVL scientists.”

The project involved large and small companies from around Europe, including ASML, Phystex, Carl Zeiss, AMTC, Philips EUV, Xtreme technologies, Focus, Sigma-C, AZ Electronic Materials, Schott Lithotec, Philips, Xenocs, Sagem Défense Sécurité, Imagine Optic, EPPRA and Media Lario.

Academic and research institutions included IMEC, CEA-Leti, CNRS, TNO, FOM Rijnhuizen, Fraunhofer Institute, ISAN and IPM RAS (Russian Institutes of Science), ENEA, ELETTRA and NCSR, as well as universities of Bielefeld, Mainz, Delft and Birmingham.