QUOTE (DavidD+May 26 2008, 11:10 AM)
Interesting why? Becouse transistors much more bigger volume (or probablu more precisly transistor surface), or becouse somthing else (some over reasons)? Maybe you jsut think, that transistor isn't economical? Or transistors harder to izolate than wires?
Leakage still requires a voltage to drive the current. It is just that the resistance to the current is effectively very large. But without the voltage, you will have no current.
I think sleep states work this way, and this also motivates the ultralow voltage processors. Transistors which operate over low voltages have little current to work with. Since their current is less, their power consumption is less but also their ability to move charges is slower.
DavidD
27th May 2008 - 11:33 AM
IF resistance is big, then over long distacne of wires it's loosing many energy (in watts) and this energy becoming don't enough to switch transistor. If leakage is smaller becouse of better isolation, then you with smaller voltage can build working processor. I still think that the most energy is for transistors swithching and for leakage through izolators and wires resistance is almost don't doing impact. Becouse the most important that transistor work at small voltage.
Enthalpy
9th June 2008 - 01:14 AM
Hi Guiding_Light!
Just to confirm that varied people read your posts, so go on!
plasma_guy
2nd October 2008 - 12:37 PM
QUOTE (guiding_light+May 22 2008, 09:06 PM)
Checking the stats for Sigma7500-II from Micronic Laser Systems, they can now do a practical resolution of 120 nm with a typical 3 hr write time. With further advances, I think it can push to 100 nm or maybe even 90 nm. 120 nm already corresponds to 30 nm on a state-of-the-art advanced photomask, and this is practically enough for the 45 nm node. Electron beam lithography would literally take days to do the same job.
I see now this is an unbelievable benefit for the industry.
If we consider trying to write 45 nm or smaller on the mask itself (for 16 or 11 nm node), this is ridiculously hard to do even for the e-beam.
But tool resolution need not impossibly improve if we become more productive and do multiple patterning instead.
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