Imprint after Immersion?

guiding_light

12th January 2007 - 01:49 PM

Toshiba has been one of the earlier adopters of immersion lithography, but the latest news suggests that the company has started looking into nanoimprint lithography for 32 nm node and below.

The big point for nanoimprint is essentially that it is the cheapest way to 32 nm and beyond, it's just that it is not popular and established yet in the semiconductor industry. But all it has to do is follow immersion's footsteps.

kaneda

1st February 2007 - 10:00 AM

Some uses for such technology:

http://www.reed-electronics.com/semiconduc...ticle/CA6356252

nanomvp

17th October 2007 - 11:59 AM

The newsis that Toshiba is ready to use imprinting for 22 nm node and beyond.

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