Microelectronic Engineering
Volume 83, Issues 4-9 , April-September 2006, Pages 940-943
Micro- and Nano-Engineering MNE 2005

Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

Jun Taniguchia, , , Kentaro Kogaa, Yasuo Kogob and Iwao Miyamotoa

aDepartment of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
bDepartment of Materials Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan

Abstract
The characteristics of focused ion beam (FIB) lithography for spin-on-glass (SOG) and PMMA resists were investigated. These resists have high sensitivity around 1 μC/cm2 and their depth gradations were obtained by using less than 1 μC/cm2. In particular, FIB lithography working with SOG resists can be used for speedy fabrication of three-dimensional (3D) nanoimprint template. Furthermore, this combination of FIB and SOG has the potential for alternative to EB cutting which is the next generation media mastering technique. Using fabricated SOG template, UV-nanoimprint lithography was carried out and replicated pattern with 59.8 nm gap was obtained.