I have been reading that they can now demonstrate theoretically, that you can obtain a repulsive casmir effect for nanoscale machines to overcome mechanical friction, by using chiral metamaterials. Mathematical simulations have revealed the possibility of a new class of materials able to exert a repulsive force when they are placed in extremely close proximity to each other. They have been focusing on a geometric structure that will allow them to change the nature of energy waves between the two closely positioned plates, which will cause the waves to create a repulsive Casimir force. The mathematical models were done over a year ago.
They demonstrated theoretically by extending the Lifshitz theory to treat chiral metamaterials. It sounds like there are many difficulties involved in fabricating these materials with semiconductor lithographic techniques. I could be wrong, but it read, as if more problems could also exist. One maybe from the photoresist exposure in the standing wave effect. The interference that causes standing waves also results in a phenomenon called swing curves, the sinusoidal variation in linewidth with changing resist thickness, which can be cured with bottom antireflective coating (BARC). However, as the sizes shrink new and more advanced materials will be needed to achieve the goals set by the semiconductor industry. Improvements in both photoresists and bottom anti-reflective coatings are needed to achieve high-resolution lithography targets.
If this could be done it would be a great achievement. I don't know if any progress has been made because I haven't been able to find any current information. What I don't quite understand is what they mean by extending the Lifshitz theory. Does anyone else?