Desperate Solution For Ses

guiding_light

14th January 2010 - 06:21 AM

http://www.freepatentsonline.com/7463336.html

ASML hopes to control the secondary electrons (SEs) inevitable with their EUV tool with an electric field across the resist. Needs the metal layer on resist. But the metal layer will absorb the radiation and gas will bubble underneath. Not to mention so thin a layer will have a large sheet resistance, so the SEs will be dragged across the wafer.

Enthalpy

30th January 2010 - 11:00 PM

I don't see these difficulties as impossibilities...
What happens if you put numbers on them?

guiding_light

31st January 2010 - 02:37 PM

There is no clean number for a secondary electron's motion, it is a wide range. The big problem is metal contamination in litho bay.

Guest

5th February 2010 - 01:44 PM

QUOTE (Enthalpy+Jan 30 2010, 11:00 PM)

I don't see these difficulties as impossibilities...
What happens if you put numbers on them?

Trying to stop 5 eV or 80 eV electrons within 1 nm takes too strong an electric field - even the most robust materials will simply break down, and cannot sustain the field anymore.

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