42 nm half-pitch single exposure

guiding_light

17th October 2006 - 12:00 AM

http://www.physorg.com/news79281675.html

The way I read this is they can claim to do 42 nm half-pitch in single exposure. With 1.35 NA this can be extrapolated to 40 nm half-pitch.

I wonder what resist thickness they are using. My guess is less than 100 nm is required for such features not to fall over.

from texas

4th December 2006 - 01:53 AM

Another way to read it is, they are having a hard time getting the photoresist to get close to 40 nm half-pitch, let alone below. This seems to be a problem independent of what you use to expose the resist.

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